Atomic Layer Deposition-太阳能研究部

Head of Division

Prof. Can Li

Prof. Can Li has been working on both fundamental and applied research in catalysis and making efforts to reveal the essential relationship between catalytic performance and catalyst structure, and try to understand catalysis at various ……

g on both fundamental and applied research in catalysis and making efforts to reveal the essential relationship between catalytic performance and catalyst structure, and try to understand catalysis at various ……

News

A new progress in the structural modulation and photoelectric properties of lead-free perovskite ...
LI Can is awarded 2020 Mission Innovation Champions
Scientists proposed a practically feasible approach for scalable solar hydrogen production via wa...
Scientists unravel the reason of active facets-dependent photocatalytic activities of semiconduct...
3rd Symposium of Advanced Lectures on Fundamentals for Solar Energy Conversion: Theory and Experi...

Equipments

Atomic Layer Deposition

发布人：管理员发布时间：2014年06月04日返回首页

原子层沉积（ALD）是目前精度最高的薄膜制备技术。ALD工作原理简单，依靠单原子层的化学吸附进而进行反应，从而达到每次反应都限制在单原子层的范围内；经过多次反复反应，最终形成厚度非常均匀且高度可控的薄膜材料。特别是超薄膜材料的制备，ALD具有其他技术不可替代的优势。

ALD理论上可广泛适用于制备各类薄膜材料，但由于在反应前驱体选择的限制难，目前，ALD技术主要应用在氧化物薄膜材料的制备，最近在催化领域的应用逐步得到重视；而我们引进的该设备主要用于半导体薄膜材料的研究：该设备具有6路反应气路，反应温度达600oC,显著拓宽了该设备的使用范围；同时，前驱体耗费量很低，大大节约昂贵前驱体材料的使用量。